Electron beam apparatus with high resolutions
US10096447B1 · kind B1 · utility
3Cited by
20References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2017 |
| Grant date | Oct 9, 2018 |
| Priority date | — |
| Expiry date | Aug 2, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/28
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A magnetic gun lens and an electrostatic gun lens can be used in an electron beam apparatus and can help provide high resolutions for all usable electron beam currents in scanning electron microscope, review, and/or inspection uses. An extracted beam can be directed at a wafer through a beam limiting aperture using the magnetic gun lens. The electron beam also can pass through an electrostatic gun lens after the electron beam passes through the beam limiting aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.