Patent · US Active

Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing films

US10106887B2 · kind B2 · utility

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1References

12Claims

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Assignee

L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR

Inventors

Clément Lansalot-Matras · Tsukuba, JP
Wontae Noh · Seoul, KR
Jooho LEE · Seoul, KR

Key dates

Filing date	Nov 13, 2013
Grant date	Oct 23, 2018
Priority date	—
Expiry date	Nov 13, 2033

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/452
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Disclosed are Group 5 transition metal-containing thin film forming precursors. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 5 transition metal-containing thin films on one or more substrates via vapor deposition processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.