Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device
US10108084B2 · kind B2 · utility
3Cited by
3References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 2015 |
| Grant date | Oct 23, 2018 |
| Priority date | — |
| Expiry date | Jun 5, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2004
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.