Yosuke Ono
20Patents
3h-index
23Co-inventors
59Inventor score
Filing activity: Jul 21, 2010 → Aug 25, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9703187B2 | Pellicle and EUV exposure device comprising same | Physics | 11 | Active |
| US9841670B2 | Support frame for pellicles | Physics | 5 | Active |
| US10108084B2 | Pellicle membrane, pellicle, original plate for exposure, exposure apparatus, and method of producing semiconductor device | Physics | 3 | Active |
| US11042085B2 | Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device | Chemistry; Metallurgy | 3 | Active |
| US10216081B2 | Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device | Electricity | 2 | Active |
| US11204547B2 | Pellicle support frame, pellicle, method for manufacturing pellicle support frame, and exposure original plate and exposure device employing pellicle | Physics | 1 | Active |
| US9242504B2 | Method and product of hydraulic transfer | Performing Operations; Transporting | 1 | Active |
| US10585348B2 | Pellicle, pellicle production method and exposure method using pellicle | Physics | 1 | Active |
| US10606169B2 | Pellicle frame, pellicle containing same, method for producing pellicle frame, and method for producing pellicle | Chemistry; Metallurgy | 0 | Active |
| US10261411B2 | Pellicle film, pellicle frame, pellicle, and method for producing same | Physics | 0 | Active |
| US12386252B2 | Pellicle film, pellicle, exposure original plate, exposure device, and method for manufacturing pellicle film | Physics | 0 | Active |
| US11243463B2 | Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device | Physics | 0 | Active |
| US10488751B2 | Pellicle, production method thereof, exposure method | Electricity | 0 | Active |
| US9776387B2 | Method for producing transparent adhesive sheet for optical applications, transparent adhesive sheet for optical applications, and display device using same | Emerging Cross-Sectional Technologies | 0 | Active |
| US10185217B2 | Pellicle frame, pellicle and method of manufacturing the same, original plate for exposure and method of manufacturing the same, exposure device, and method of manufacturing semiconductor device | General | 0 | Revoked |
| US10895805B2 | Pellicle manufacturing method and method for manufacturing photomask with pellicle | Physics | 0 | Active |
| US10990001B2 | Pellicle film, pellicle frame, pellicle, method for producing same, original plate for light exposure, light exposure apparatus and method for manufacturing semiconductor device | General | 0 | Revoked |
| US11852968B2 | Pellicle, exposure master, exposure device and method for manufacturing semiconductor device | Physics | 0 | Active |
| US10106660B2 | Film containing a resin having a thiourethane bond and uses thereof | Emerging Cross-Sectional Technologies | 0 | Active |
| US11137677B2 | Pellicle, exposure original plate, exposure device, and semiconductor device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.