Method for localizing defects on substrates

US10108085B2 · kind B2 · utility

Assignees

• Carl Zeiss SMT GmbH · DE
• Carl Zeiss AG · DE

Inventors

• Jan Hendrik Peters · Wuppertal, DE
• Jörg Frederik Blumrich · Jena, DE
• Dirk Seidel · Jena, DE
• Christoph Husemann · Jena, DE

Key dates

• Filing date: Jan 6, 2017
• Grant date: Oct 23, 2018
• Expiry date: May 12, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/22
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

In a method for localizing defects on a substrate for EUV masks, a phase contrast optical unit having a phase mask is used for examining the substrate.