Patent · US Active

Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus

US10109451B2 · kind B2 · utility

1Cited by

0References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Georg JOST · Munich, DE
Ludwig Ledl · Drolshagen, DE
Bernhard Mueller · Finsing, DE
George Tzeng · Elmsford, US

Key dates

Filing date	Feb 13, 2017
Grant date	Oct 23, 2018
Priority date	—
Expiry date	Feb 13, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0047
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.