Patent · US Active

Method for determining the registration of a structure on a photomask and apparatus to perform the method

US10113864B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
Carl Zeiss Meditec AG · DE

Inventors

Michael Arnz · Oberkochen, DE
Dirk Seidel · Jena, DE
Gerd Klose · Hamburg, DE

Key dates

Filing date	Feb 26, 2016
Grant date	Oct 30, 2018
Priority date	—
Expiry date	Aug 16, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/84
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.