System and method for in situ temperature measurement
US10113917B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 6, 2015 |
| Grant date | Oct 30, 2018 |
| Priority date | — |
| Expiry date | Aug 17, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K2217/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for monitoring the temperature of a platen and a workpiece disposed on that platen is disclosed. Since the platen is a dielectric material, its properties, such as resistivity and conductivity, may change as a function of temperature. By understanding the relationship between these parameters and temperature, it may be possible to indirectly determine the temperature of the platen. For example, the platen may be in electrical communication with a power supply, which provides a clamping voltage for the workpiece. By monitoring the current waveform associated with the clamping voltage, it is possible to determine changes in the characteristics of the platen. Based on these changes, the temperature of the platen may be calculated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.