Vacuum processing apparatus
US10121686B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2015 |
| Grant date | Nov 6, 2018 |
| Priority date | — |
| Expiry date | Jan 30, 2035 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16K31/128
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
The present invention provides a vacuum processing apparatus that includes gas supply means having a hard interlock of a pair of gas valves.The present invention provides a vacuum processing apparatus including: a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit including an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.