Method and assembly for determining the thickness of a layer in a sample stack
US10132612B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2017 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | May 20, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and assembly for determining the thickness of layers of a sample stack influencing the intensity of reflected light from a light source. The thickness is determined from the intensity detected by an array detector with a plurality of detector elements in lines and columns. The detector comprises a plurality of sections in the form of parallel stripes, the stripes detecting the light reflected by the sample stack of layers simultaneously. Light of one selected wavelength range only is detected by each of the plurality of sections of the detector. The image of the sample stack on the detector or of the parallel stripes is moved in a direction perpendicular to the longitudinal direction of the parallel stripes such that each point of the sample stack is detected at least once in each of the different wavelength ranges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.