Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
US10133180B2 · kind B2 · utility
1Cited by
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18Claims
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Key dates
| Filing date | Oct 5, 2012 |
| Grant date | Nov 20, 2018 |
| Priority date | — |
| Expiry date | Oct 5, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Semi-aqueous, alkaline microelectronic cleaning composition of pH ≥8 containing:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.