Patent assignee · US · COMPANY

AVANTOR PERFORMANCE MATERIALS, LLC

20Patents
20Active
20Granted
50Portfolio score

Filing activity: May 27, 2003 → Jul 9, 2018 · 13 expiring within 5 years

Most-cited patents

PatentTitleAreaCited byStatus
US7928046B2 Stripping and cleaning compositions for microelectronics Electricity 9 Active
US8481472B2 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition Chemistry; Metallurgy 4 Active
US7951764B2 Non-aqueous, non-corrosive microelectronic cleaning compositions Physics 3 Active
US9570343B2 Rinsing solution to prevent TiN pattern collapse Electricity 3 Active
US8906838B2 Microelectronic cleaning and arc remover compositions Electricity 3 Active
US8497233B2 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers Chemistry; Metallurgy 2 Active
US9327966B2 Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-K dielectrics Chemistry; Metallurgy 2 Active
US8338350B2 Gluconic acid containing photoresist cleaning composition for multi-metal device processing Physics 2 Active
US8178482B2 Cleaning compositions for microelectronic substrates Electricity 2 Active
US8044009B2 Compositions for cleaning ion implanted photoresist in front end of line applications Chemistry; Metallurgy 2 Active
US8183195B2 Peroxide activated oxometalate based formulations for removal of etch residue Chemistry; Metallurgy 2 Active
US7947639B2 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors Physics 1 Active
US10133180B2 Microelectronic substrate cleaning compositions having copper/azole polymer inhibition Chemistry; Metallurgy 1 Active
US8168577B2 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion Chemistry; Metallurgy 0 Active
US10961391B2 Curable organopolysiloxane composition containing dynamic covalent polysiloxane Chemistry; Metallurgy 0 Active
US8557757B2 Multipurpose acidic, organic solvent based microelectronic cleaning composition Chemistry; Metallurgy 0 Active
US8366954B2 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level Electricity 0 Active
US11319513B2 Non-aqueous tungsten compatible metal nitride selective etchants and cleaners Electricity 0 Active
US8986559B2 Compositions and methods for texturing polycrystalline silicon wafers Emerging Cross-Sectional Technologies 0 Active
US11661258B2 Packaging system for storage and shipment of solids Performing Operations; Transporting 0 Active

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.