Patent · US Active

Illumination optical assembly for a projection exposure apparatus

US10133182B2 · kind B2 · utility

0Cited by

0References

18Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Martin Endres · Oberkochen, DE
Stig Bieling · Aalen, DE

Key dates

Filing date	Feb 17, 2017
Grant date	Nov 20, 2018
Priority date	—
Expiry date	Feb 17, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/702
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination optical assembly for a projection exposure apparatus includes a first facet element having a multiplicity of first facets, which are formed in each case by a multiplicity of displaceable individual mirrors, and a second facet element having a multiplicity of second facets. The displacement positions of the individual mirrors of the first facets are chosen in each case in so that, in the case of a predefined intensity distribution of an illumination radiation in an intermediate focus, the illumination radiation in the region of the facets of the second facet element has an intensity distribution with a maximum which is at most equal to a predefined maximum intensity or which is greater than a mean value of the intensity distribution by at most a predefined factor or absolute value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.