Stig Bieling
20Patents
2h-index
29Co-inventors
53Inventor score
Filing activity: Nov 18, 2010 → Jul 9, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9046786B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 4 | Active |
| US8395754B2 | Illumination optical unit for EUV microlithography | Physics | 3 | Active |
| US9477157B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US8294877B2 | Illumination optical unit for projection lithography | Physics | 2 | Active |
| US9983484B2 | Illumination optical unit for EUV projection lithography | Physics | 2 | Active |
| US11169445B2 | Pupil facet mirror, optical system and illumination optics for a projection lithography system | Physics | 2 | Active |
| US10146136B2 | Reflecting coating with optimized thickness | Physics | 1 | Active |
| US10599041B2 | Facet mirror | Physics | 1 | Active |
| US10018917B2 | Illumination optical unit for EUV projection lithography | Physics | 1 | Active |
| US9791784B2 | Assembly for a projection exposure apparatus for EUV projection lithography | Physics | 1 | Active |
| US10409167B2 | Method for illuminating an object field of a projection exposure system | Physics | 0 | Active |
| US8345219B2 | Method and apparatus for setting an illumination optical unit | Physics | 0 | Active |
| US9874819B2 | Mirror array | Physics | 0 | Active |
| US9983483B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US10948828B2 | Illumination optical element for projection lithography | Physics | 0 | Active |
| US10394129B2 | Microlithographic illumination unit | Physics | 0 | Active |
| US11003086B2 | Illumination optical device for projection lithography | Physics | 0 | Active |
| US10324380B2 | Projection exposure apparatus and method for measuring an imaging aberration | Physics | 0 | Active |
| US10133182B2 | Illumination optical assembly for a projection exposure apparatus | Physics | 0 | Active |
| US9983482B2 | Radiation collector, radiation source and lithographic apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.