Substrate processing apparatuses and systems
US10138551B2 · kind B2 · utility
3Cited by
36References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2011 |
| Grant date | Nov 27, 2018 |
| Priority date | — |
| Expiry date | Oct 20, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B3/22
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for processing substrates is described. In one embodiment, the system comprises a process chamber, at least one electrical resistance heater, and at least one Coanda effect gas injector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.