Patent · US Active

Probe guide, probe card, and method for probe guide manufacturing

US10139430B2 · kind B2 · utility

0Cited by
3References
7Claims
0Family size

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Key dates

Filing dateJan 31, 2017
Grant dateNov 27, 2018
Priority date
Expiry dateJan 31, 2037

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01R3/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

OBJECTTo improve the strength of a probe guide and improve the abrasion resistance of the probe guide.MEANS FOR SETTLEMENTA guide plate 20 is formed of a silicon plate 22 having guide holes 23 respectively adapted to support contact probes 13, the inner walls of the guide holes 23 include a guide film 25 formed on the inner wall surfaces of corresponding penetration-processed holes 24 of the silicon plate 22, the cross-sectional areas of the penetration-processed holes 24 gradually increase toward a first surface of the silicon plate 22, and the film thickness of the guide film 25 gradually increases toward the first surface of the silicon plate 22. By employing such a configuration, as compared with the tilts of the inner wall surfaces of the penetration-processed holes 24, the tilts of the inner wall surfaces of the guide holes 23 can be suppressed, and the strength of the silicon plate 20 can be improved. Accordingly, the abrasion resistance of a probe guide 100 can be improved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.