Three dimensional memory device and method for fabricating the same
US10141328B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2016 |
| Grant date | Nov 27, 2018 |
| Priority date | — |
| Expiry date | Feb 8, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/35
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A 3D memory device includes a substrate, a ridge-shaped stack, a memory layer, a channel layer and a capping layer. The ridge-shaped stack includes a plurality of conductive strips extending along a first direction and stacked on the substrate. The memory layer is stacked on a vertical sidewall of the ridge-shaped stack along a second direction that forms a non-straight with the first direction. The channel layer is stacked on the memory layer along the second direction and has a narrow sidewall having a long side extending along the first direction. The capping layer is stacked on the narrow sidewall along a third direction that forms a non-straight angle with the second direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.