Patent · US Active

Apparatus for processing materials at high temperatures and pressures

US10145021B2 · kind B2 · utility

0Cited by

4References

37Claims

0Family size

Assignee

SLT Technologies, Inc. · US

Inventors

Kirsh Afimiwala · Fairfield, US
Larry Qiang Zeng · Strongsville, US

Key dates

Filing date	Jul 28, 2011
Grant date	Dec 4, 2018
Priority date	—
Expiry date	Feb 13, 2032

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T117/1096
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

An apparatus for processing materials at high temperatures comprises a high strength enclosure; a plurality of high strength radial segments disposed adjacent to and radially inward from the high strength enclosure; a liner disposed adjacent to and radially inward from the radical segments; a chamber defined interior to the liner; a heating device disposed within the chamber; and a capsule disposed within the chamber, the capsule configured to hold a supercritical fluid. The apparatus may be used for growing crystals, e.g., GaN, under high temperature and pressure conditions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.