Patent · US Active

Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus

US10146138B2 · kind B2 · utility

1Cited by

3References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Kerstin Hild · Schwäbisch Gmünd, DE
Franz-Josef Stickel · Aalen, DE
Robert Fichtl · Aalen, DE
Joachim Hartjes · Aalen, DE

Key dates

Filing date	Jul 13, 2017
Grant date	Dec 4, 2018
Priority date	—
Expiry date	Jul 13, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.