Kerstin Hild
15Patents
2h-index
35Co-inventors
46Inventor score
Filing activity: Mar 28, 2016 → Jan 12, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10908509B2 | Mirror, in particular for a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9785054B2 | Mirror, more particularly for a microlithographic projection exposure apparatus | Electricity | 2 | Active |
| US10684466B2 | Mirror arrangement for lithography exposure apparatus and optical system comprising mirror arrangement | Physics | 2 | Active |
| US11187990B2 | Mirror for a microlithographic projection exposure apparatus, and method for operating a deformable mirror | Physics | 1 | Active |
| US10852643B2 | Optical system, and method | Physics | 1 | Active |
| US10331048B2 | Mirror, in particular for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US10146138B2 | Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US11360393B2 | Mirror, in particular for a microlithographic projection exposure system | Physics | 1 | Active |
| US11366395B2 | Mirror, in particular for a microlithographic projection exposure system | Physics | 1 | Active |
| US12411417B2 | Projection objective including an optical device | Electricity | 0 | Active |
| US12276917B2 | Mirror, in particular for microlithography | Electricity | 0 | Active |
| US11328831B2 | Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatus | Physics | 0 | Active |
| US11137687B2 | Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma | Physics | 0 | Active |
| US11029515B2 | Optical element, and method for correcting the wavefront effect of an optical element | Physics | 0 | Active |
| US12210289B2 | Mirror, in particular for a microlithographic projection exposure apparatus | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.