Patent · US Active

Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs

US10149390B2 · kind B2 · utility

0Cited by

37References

15Claims

0Family size

Assignee

Mycronic AB · SE

Inventors

Per Askebjer · Åkersberga, SE
Mats Rosling · Täby, SE

Key dates

Filing date	Aug 27, 2013
Grant date	Dec 4, 2018
Priority date	—
Expiry date	Mar 27, 2034

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49155
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The technology disclosed relates to accommodating embedded substrates during direct writing onto a printed circuit board and to other patterning problems that benefit from an extended depth of focus. In particular, it relates to multi-focus direct writing of a workpiece by the continuous or step-wise movement of the workpiece during the sequence of exposures having different focus planes. In one implementation, a multi-arm rotating direct writer is configured for interleaved writing focused on two or more focal planes that generally correspond to two or more surface heights of a radiation sensitive layer that overlays the uneven workpiece. Alternating arms can produce interleaved writing to the two or more focal planes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.