Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and a non-transitory computer-readable recording medium
US10156012B2 · kind B2 · utility
2Cited by
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15Claims
0Family size
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Key dates
| Filing date | Sep 5, 2017 |
| Grant date | Dec 18, 2018 |
| Priority date | — |
| Expiry date | Sep 5, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided a cleaning method improving cleaning efficiency in a process container after an oxygen-containing film forming process is having performed, including: (a) supplying at least a hydrogen fluoride gas into the process container; and (b) supplying an alcohol into the process container in a state where supply of the hydrogen fluoride gas into the process container is stopped, wherein (a) and (b) are continuously performed without providing an intermittent period therebetween.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.