Substrate processing device, method for controlling substrate processing device, and storage medium storing programs
US10163672B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Aug 23, 2017 |
| Grant date | Dec 25, 2018 |
| Priority date | — |
| Expiry date | Aug 23, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing device for processing a substrate, comprising: an image sensor for detecting positions of two corners on at least one diagonal line of a substrate when the substrate is moved to a predetermined position; an illuminating device that can be disposed so as to illuminate the two corners of the substrate on an opposite side of the substrate at the predetermined position to the image sensor; and a control device for determining the position of the substrate, based on the positions of the two corners detected by the image sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.