Apparatus for decontaminating windows of an EUV source module
US10165664B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2018 |
| Grant date | Dec 25, 2018 |
| Priority date | — |
| Expiry date | Jan 29, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An apparatus, and a method of using the same, for monitoring and removing tin contamination on windows of an extreme ultraviolet lithography (EUVL) radiation source vessel includes an optical sensing module embedded in one or more monitoring units for inspecting the EUV radiation source. The optical sensing module measures intensity of infrared (IR) radiation. The apparatus further includes heating elements, hydrogen gas supply module, and a gas removal module for removing the tin contamination when the intensity of the IR radiation falls below a threshold of a baseline intensity corresponding to a substantially uncontaminated window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.