Bo-Tsun Liu
55Patents
4h-index
35Co-inventors
62Inventor score
Filing activity: Feb 11, 2013 → Apr 26, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10314154B1 | System and method for extreme ultraviolet source control | Electricity | 12 | Active |
| US10524345B2 | Residual gain monitoring and reduction for EUV drive laser | Electricity | 6 | Active |
| US10165664B1 | Apparatus for decontaminating windows of an EUV source module | Electricity | 4 | Active |
| US10656539B2 | Radiation source for lithography process | Electricity | 4 | Active |
| US10429729B2 | EUV radiation modification methods and systems | Physics | 3 | Active |
| US10718718B2 | EUV vessel inspection method and related system | Electricity | 3 | Active |
| US10976674B2 | Method for detecting EUV pellicle rupture | Physics | 2 | Active |
| US10928741B2 | Radiation source for lithography process | Electricity | 2 | Active |
| US10429314B2 | EUV vessel inspection method and related system | Electricity | 2 | Active |
| US11275301B2 | Extreme ultraviolet mask and method of manufacturing the same | Physics | 2 | Active |
| US10917959B2 | EUV radiation modification methods and systems | Physics | 2 | Active |
| US10338475B2 | Light source for lithography exposure process | Electricity | 2 | Active |
| US11392022B2 | Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof | Physics | 1 | Active |
| US10955762B2 | Radiation source apparatus and method for decreasing debris in radiation source apparatus | Electricity | 1 | Active |
| US10495987B2 | Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system | Electricity | 1 | Active |
| US11419203B2 | EUV radiation modification methods and systems | Physics | 1 | Active |
| US10509324B2 | Light source for lithography exposure process | Electricity | 1 | Active |
| US11774844B2 | Extreme ultraviolet mask and method of manufacturing the same | Physics | 1 | Active |
| US10712676B2 | Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system | Electricity | 1 | Active |
| US11013097B2 | Apparatus and method for generating extreme ultraviolet radiation | Electricity | 1 | Active |
| US10980100B2 | Residual gain monitoring and reduction for EUV drive laser | Electricity | 1 | Active |
| US10842009B2 | System and method for extreme ultraviolet source control | Electricity | 1 | Active |
| US11275318B2 | Radiation source for lithography process | Electricity | 1 | Active |
| US10477663B2 | Light source for lithography exposure process | Electricity | 1 | Active |
| US10506698B2 | EUV source generation method and related system | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.