Patent · US Active

Using chemical vapor deposited films to control domain orientation in block copolymer thin films

US10167410B2 · kind B2 · utility

0Cited by

14References

20Claims

0Family size

Assignee

The Board of Regents of the University of Texas System · US

Inventors

C. Grant Wilson · Austin, US
William J. Durand · San Francisco, US
Christopher John Ellison · Austin, US
Christopher M. Bates · Austin, US
Takehiro Seshimo · Kawasaki, JP
Julia Cushen · San Francisco, US
Logan J. Santos · Austin, US
Leon Dean · Spokane, US
Erica L. Rausch · Austin, US

Key dates

Filing date	Apr 28, 2015
Grant date	Jan 1, 2019
Priority date	—
Expiry date	Sep 1, 2036

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/31931
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

Vacuum deposited thin films of material are used to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nano structured features in a block copolymer film that can serve as lithographic patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.