Takehiro Seshimo
45Patents
6h-index
64Co-inventors
68Inventor score
Filing activity: Jul 10, 2006 → Dec 7, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7713679B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Emerging Cross-Sectional Technologies | 48 | Active |
| US7776510B2 | Resist composition, method of forming resist pattern, compound and acid generator | Emerging Cross-Sectional Technologies | 12 | Active |
| US7682772B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Emerging Cross-Sectional Technologies | 11 | Active |
| US8206891B2 | Positive resist composition and method of forming resist pattern | Emerging Cross-Sectional Technologies | 7 | Active |
| US8124313B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Emerging Cross-Sectional Technologies | 6 | Active |
| US8415082B2 | Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator | Physics | 6 | Active |
| US7488568B2 | Resist composition, method of forming resist pattern, compound and acid generator | Emerging Cross-Sectional Technologies | 5 | Active |
| US8338076B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Physics | 5 | Active |
| US7927780B2 | Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator | Emerging Cross-Sectional Technologies | 4 | Active |
| US8007981B2 | Resist composition and method of forming resist pattern | Emerging Cross-Sectional Technologies | 3 | Active |
| US9169421B2 | Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material | Chemistry; Metallurgy | 3 | Active |
| US7745097B2 | Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern | Emerging Cross-Sectional Technologies | 2 | Active |
| US10366888B2 | Pattern forming method | Electricity | 2 | Active |
| US9567477B2 | Undercoat agent and method of producing structure containing phase-separated structure | Chemistry; Metallurgy | 2 | Active |
| US7955777B2 | Compound, acid generator, resist composition and method of forming resist pattern | Emerging Cross-Sectional Technologies | 2 | Active |
| US8932795B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Physics | 2 | Active |
| US8367299B2 | Resist composition, method of forming resist pattern, compound and acid generator | Emerging Cross-Sectional Technologies | 1 | Active |
| US9314819B2 | Anhydride copolymer top coats for orientation control of thin film block copolymers | Performing Operations; Transporting | 1 | Active |
| US9442371B2 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | Physics | 1 | Active |
| US9157008B2 | Anhydride copolymer top coats for orientation control of thin film block copolymers | Emerging Cross-Sectional Technologies | 1 | Active |
| US9188869B2 | Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern | Chemistry; Metallurgy | 1 | Active |
| US9644110B2 | Method of producing structure containing phase-separated structure and method of forming top coat film | Performing Operations; Transporting | 1 | Active |
| US8415085B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | Emerging Cross-Sectional Technologies | 1 | Active |
| US8206890B2 | Resist composition, method of forming resist pattern, compound and acid generator | Emerging Cross-Sectional Technologies | 1 | Active |
| US9206307B2 | Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern | Performing Operations; Transporting | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.