Spin chuck with rotating gas showerhead
US10167552B2 · kind B2 · utility
0Cited by
22References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2015 |
| Grant date | Jan 1, 2019 |
| Priority date | — |
| Expiry date | Apr 23, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for processing wafer-shaped articles comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, and a rotating shower head for supplying process gas to a surface of a wafer-shaped article when held by the spin chuck. The rotating shower head comprises an outlet plate having plural openings formed in each of a central and a peripheral region thereof. A process gas feed is provided so as to supply process gas to a gas distribution chamber. The gas distribution chamber is in fluid communication with a plurality of openings formed in the shower head.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.