Optical device for a lithography apparatus, and lithography apparatus
US10168619B1 · kind B1 · utility
3Cited by
0References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 7, 2018 |
| Grant date | Jan 1, 2019 |
| Priority date | — |
| Expiry date | Sep 7, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure relates to an optical device for a lithography system, including an optical element, a supporting frame supporting the optical element, a sensor frame mechanically decoupled from the supporting frame, wherein a gap is provided between the supporting frame and the sensor frame, and a sensor assembly designed to determine a width of the gap in a contactless manner. The sensor assembly has a contact element and a contact surface. The contact element is designed to contact the contact surface to limit relative motion of the supporting frame relative to the sensor frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.