Ralf Zweering
8Patents
2h-index
22Co-inventors
40Inventor score
Filing activity: Sep 7, 2018 → Dec 17, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10168619B1 | Optical device for a lithography apparatus, and lithography apparatus | Physics | 3 | Active |
| US11415895B2 | Compensation of creep effects in an imaging device | Physics | 2 | Active |
| US11526089B2 | Compensation of creep effects in an imaging device | Physics | 0 | Active |
| US10809636B2 | Optical arrangement, in particular lithography system | Physics | 0 | Active |
| US12222655B2 | Stop, optical system and lithography apparatus | Physics | 0 | Active |
| US11048177B2 | Projection exposure apparatus for semiconductor lithography with improved component adjustment and adjustment method | Physics | 0 | Active |
| US10761436B2 | Optical arrangement, in particular lithography system, with a transport lock | Physics | 0 | Active |
| US11703770B2 | Compensation of creep effects in an imaging device | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.