Patent · US Active

Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus

US10174415B2 · kind B2 · utility

0Cited by

3References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Frank SCHNAPPENBERGER · Johannesberg, DE
Anke HELLMICH · Alzenau, DE
Thomas Koch · Kleinwallstadt, DE
Thomas DEPPISCH · Aschaffenburg, DE

Key dates

Filing date	Sep 24, 2013
Grant date	Jan 8, 2019
Priority date	—
Expiry date	Sep 24, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3299
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.