Lithographic apparatus and a method of operating the apparatus
US10175585B2 · kind B2 · utility
0Cited by
8References
21Claims
0Family size
Assignee
Inventors
- Robert Douglas Watso
- Youri Johannes Laurentius Maria Van Dommelen
- Johannes Henricus Wilhelmus Jacobs
- Hans Jansen
- Martinus Hendrikus Antonius Leenders
- Jeroen Johannes Sophia Maria Mertens
- Peter Paul Steijaert
- Antonius Martinus Cornelis Petrus De Jong
- Jimmy Matheus Wilhelmus Van De Winkel
- Joao Paulo Da Paz Sena
- Maurice Martinus Johannes Van Der Lee
- Henricus Martinus Dorotheus Van Lier
- Gheorghe Tanasa
Key dates
| Filing date | Aug 29, 2014 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | Jan 13, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.