Decompression processing apparatus
US10175588B2 · kind B2 · utility
1Cited by
1References
1Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 2, 2017 |
| Grant date | Jan 8, 2019 |
| Priority date | — |
| Expiry date | Nov 18, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed herein is a decompression processing apparatus for processing a wafer in a decompressed state including a chamber having a decompressing unit configured to decompress the inside of the chamber, an opening and closing door configured to open and close a carrying-in-and-out opening for carrying the wafer into and out of the chamber, and an inert gas supply source configured to supply an inert gas to the inside of the chamber. The inside of the chamber is maintained in a dry state by continuing to supply the inert gas in a state in which the opening and closing door is opened.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.