Pellicle for photomask and exposure apparatus including the pellicle
US10191367B2 · kind B2 · utility
4Cited by
0References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 11, 2017 |
| Grant date | Jan 29, 2019 |
| Priority date | — |
| Expiry date | Jan 25, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided are a pellicle for a photomask, which protects the photomask from external contamination and an exposure apparatus including the pellicle for the photomask. The pellicle for the photomask includes a pellicle membrane provided spaced apart from the photomask. The pellicle membrane includes a semiconductor having a two-dimensional (2D) crystalline structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.