Hyeonjin Shin
169Patents
5h-index
119Co-inventors
73Inventor score
Filing activity: Oct 7, 2014 → Jul 2, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10079144B2 | Composition for layered transition metal chalcogenide compound layer and method of forming layered transition metal chalcogenide compound layer | Electricity | 18 | Active |
| US9583358B2 | Hardmask composition and method of forming pattern by using the hardmask composition | Electricity | 14 | Active |
| US10128490B2 | Anode layer, lithium secondary battery including anode layer, and method of manufacturing anode layer | Emerging Cross-Sectional Technologies | 14 | Active |
| US10199958B2 | Triboelectric generator | Electricity | 8 | Active |
| US9595580B2 | Two-dimensional (2D) material element with in-plane metal chalcogenide-based heterojunctions and devices including said element | Emerging Cross-Sectional Technologies | 7 | Active |
| US10553684B2 | Optical sensor and image sensor including graphene quantum dots | Emerging Cross-Sectional Technologies | 5 | Active |
| US10522664B2 | Electronic device including a tunnel layer | Electricity | 5 | Active |
| US9721794B2 | Hardmask composition and method of forming patterning by using the hardmask composition | Electricity | 5 | Active |
| US10587207B2 | Triboelectric generator using surface plasmon resonance | Electricity | 4 | Active |
| US10014799B2 | Triboelectric generator | Electricity | 4 | Active |
| US10134628B2 | Multilayer structure including diffusion barrier layer and device including the multilayer structure | Electricity | 4 | Active |
| US10684560B2 | Pellicle for photomask, reticle including the same, and exposure apparatus for lithography | Physics | 4 | Active |
| US9935184B2 | Electronic device including a tunneling layer | Electricity | 4 | Active |
| US10191367B2 | Pellicle for photomask and exposure apparatus including the pellicle | Physics | 4 | Active |
| US10217513B2 | Phase change memory devices including two-dimensional material and methods of operating the same | Electricity | 4 | Active |
| US11069619B2 | Interconnect structure and electronic device employing the same | Electricity | 3 | Active |
| US10424490B2 | Hardmask composition, method of forming pattern using the hardmask composition, and hardmask formed from the hardmask composition | Physics | 3 | Active |
| US11682622B2 | Interconnect structure having nanocrystalline graphene cap layer and electronic device including the interconnect structure | Electricity | 3 | Active |
| US10873275B2 | Triboelectric generator | Electricity | 3 | Active |
| US10770990B2 | Triboelectric generator | Electricity | 3 | Active |
| US10539868B2 | Pellicle for photomask, reticle including the same, and exposure apparatus for lithography | Electricity | 3 | Active |
| US10217819B2 | Semiconductor device including metal-2 dimensional material-semiconductor contact | Electricity | 3 | Active |
| US11588034B2 | Field effect transistor including gate insulating layer formed of two-dimensional material | Electricity | 3 | Active |
| US10996556B2 | Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles | Physics | 2 | Active |
| US9905422B2 | Two-dimensional material hard mask, method of manufacturing the same, and method of forming material layer pattern using the hard mask | Electricity | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.