Composition for resist patterning and method for forming pattern using same
US10191380B2 · kind B2 · utility
0Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 13, 2015 |
| Grant date | Jan 29, 2019 |
| Priority date | — |
| Expiry date | Oct 13, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
[Problem]To provide a composition capable of improving surface roughness of resist patterns, and also to provide a pattern formation method employing the composition.[Solution]The present invention provides a composition containing a particular nitrogen-containing compound, an anionic surfactant having a sulfo group, and water; and also provides a pattern formation method containing a step of applying the composition to a resist pattern beforehand developed and dried.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.