Method of reducing shot count in direct writing by a particle or photon beam
US10197909B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Oct 5, 2016 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Oct 5, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for transferring a fractured pattern decomposed into elementary shapes, onto a substrate by direct writing by a particle or photon beam, comprises a step of identifying at least one elementary shape of the fractured pattern, called removable elementary shape, whose removal induces modifications of the transferred pattern within a preset tolerance envelope; a step of removing the removable shape or shapes from the fractured pattern to obtain a modified fractured pattern; and an exposure step, comprising exposing the substrate to a plurality of shots of a shaped particle or photon beam, each shot corresponding to an elementary shape of the modified fractured pattern. A computer program product for carrying out such a method is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.