Serdar Manakli
9Patents
2h-index
10Co-inventors
44Inventor score
Filing activity: Jul 9, 2002 → Oct 5, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6807662B2 | Performance of integrated circuit components via a multiple exposure technique | Physics | 35 | Expired |
| US8713499B2 | Electron-beam lithography method with correction of line ends by insertion of contrast patterns | Electricity | 4 | Active |
| US9607808B2 | Method of electron-beam lithography with correction of corner roundings | Electricity | 1 | Active |
| US9891519B2 | Free form fracturing method for electronic or optical lithography using resist threshold control | Electricity | 0 | Active |
| US9250540B2 | Lithography method with combined optimization of radiated energy and design geometry | Electricity | 0 | Active |
| US7897308B2 | Method for transferring a predetermined pattern reducing proximity effects | Emerging Cross-Sectional Technologies | 0 | Active |
| US7955914B2 | Method of producing an asymmetric architecture semi-conductor device | Electricity | 0 | Active |
| US10197909B2 | Method of reducing shot count in direct writing by a particle or photon beam | Electricity | 0 | Active |
| US9235132B2 | Large-mesh cell-projection electron-beam lithography method | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.