Methods and systems for improved mask processing
US10199256B2 · kind B2 · utility
0Cited by
18References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2014 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Jul 11, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB65H2553/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.