High frequency power supply device and high frequency power supplying method
US10201069B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 19, 2015 |
| Grant date | Feb 5, 2019 |
| Priority date | — |
| Expiry date | Feb 11, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4645
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A high frequency power supply device and power supplying method are disclosed, which can rapidly and accurately control power used for generation of plasmas. The device includes a first high frequency power supply, providing power at frequency f1, and a second high frequency power supply providing power at frequency f2 (f1>f2). The first power supply includes: a first high frequency oscillator, which excites the high frequency power at the first frequency and has a variable frequency; a first power amplification block, which amplifies the power of the high frequency oscillator; a heterodyne detection block, which performs heterodyne detection of a reflected wave; and a first control block, which receives a signal after detection of the heterodyne detection block and a traveling wave signal, and controls an oscillating frequency of the first high frequency oscillating block and an output of the first power amplification block.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.