Combined anneal and selective deposition process
US10204782B2 · kind B2 · utility
47Cited by
57References
24Claims
0Family size
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Key dates
| Filing date | Apr 18, 2016 |
| Grant date | Feb 12, 2019 |
| Priority date | — |
| Expiry date | Apr 18, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming a film with an annealing step and a deposition step is disclosed. The method comprises an annealing step for inducing self-assembly or alignment within a polymer. The method also comprises a selective deposition step in order to enable selective deposition on a polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.