Illumination system for EUV projection exposure apparatus, EUV projection exposure apparatus including illumination system and method for operating an EUV projection exposure apparatus

US10209620B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Christoph Petri · Oberkochen, DE
• Daniel Runde · Satteldorf, DE

Key dates

• Filing date: Feb 9, 2018
• Grant date: Feb 19, 2019
• Expiry date: Feb 9, 2038

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/7085
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system for an EUV projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received EUV radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. An EUV radiation source is arranged in a source module separate from the illumination system. The illumination system includes an alignment state determining system including an alignment detector configured to receive a portion of the EUV radiation emerging from the secondary radiation source and to generate therefrom an alignment detector signal representative of the alignment state.