Lithographic apparatus with a patterning device environment
US10209635B2 · kind B2 · utility
1Cited by
6References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2015 |
| Grant date | Feb 19, 2019 |
| Priority date | — |
| Expiry date | Dec 7, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus injects gas between a patterning device and a patterning device masking blade to help protect the patterning device from contamination. The gas may be injected into the space defined between the patterning device and the patterning device blade by one or more gas supply nozzles that are arranged on at least one side of the patterning device. The one or more gas supply nozzles are coupled to a frame which a patterning device support structure moves relative to. Each nozzle may be constructed and arranged to supply gas over at least the patterning region of the reflective patterning device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.