ASML Holding N.V.
643Patents
379Active
643Granted
56Portfolio score
Filing activity: Feb 12, 1999 → May 11, 2023 · 147 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6611316B2 | Method and system for dual reticle image exposure | Physics | 353 | Expired |
| US6867844B2 | Immersion photolithography system and method using microchannel nozzles | Electricity | 278 | Expired |
| US7063920B2 | Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems | Physics | 203 | Expired |
| US6809794B1 | Immersion photolithography system and method using inverted wafer-projection optics interface | Physics | 156 | Expired |
| US7025498B2 | System and method of measuring thermal expansion | Electricity | 114 | Expired |
| US6680798B2 | Optical reduction system with control of illumination polarization | Physics | 61 | Expired |
| US7239446B2 | Optical reduction system with control of illumination polarization | Physics | 47 | Expired |
| US7031077B2 | Optical reduction method with elimination of reticle diffraction induced bias | Physics | 44 | Expired |
| US6826451B2 | Lithography tool having a vacuum reticle library coupled to a vacuum chamber | Physics | 44 | Expired |
| US6836380B2 | Optical reduction system with elimination of reticle diffraction induced bias | Physics | 44 | Expired |
| US6678572B1 | Recipe cascading in a wafer processing system | Emerging Cross-Sectional Technologies | 42 | Expired |
| US6906783B2 | System for using a two part cover for protecting a reticle | Emerging Cross-Sectional Technologies | 40 | Expired |
| US7445883B2 | Lithographic printing with polarized light | Physics | 38 | Active |
| US11360396B2 | Mode control of photonic crystal fiber based broadband radiation sources | Electricity | 36 | Active |
| US7701550B2 | Lithographic apparatus and device manufacturing method | Physics | 33 | Active |
| US7869003B2 | Lithographic apparatus and device manufacturing method with reticle gripper | Physics | 30 | Active |
| US6980277B2 | Immersion photolithography system and method using inverted wafer-projection optics interface | Physics | 29 | Expired |
| US6770424B2 | Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6760167B2 | Apparatus, system, and method for precision positioning and alignment of a lens in an optical system | Physics | 26 | Expired |
| US7234514B2 | Methods and systems for compact, micro-channel laminar heat exchanging | Mechanical Engineering; Lighting; Heating | 25 | Expired |
| US6731374B1 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system | Physics | 24 | Expired |
| US7580559B2 | System and method for calibrating a spatial light modulator | Physics | 24 | Expired |
| US7506299B2 | Feature optimization using interference mapping lithography | Physics | 24 | Active |
| US7304719B2 | Patterned grid element polarizer | Physics | 23 | Expired |
| US7363854B2 | System and method for patterning both sides of a substrate utilizing imprint lithography | Performing Operations; Transporting | 22 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.