Active substrate alignment system and method
US10217657B2 · kind B2 · utility
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Key dates
| Filing date | Sep 4, 2015 |
| Grant date | Feb 26, 2019 |
| Priority date | — |
| Expiry date | Sep 4, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An active substrate alignment system for an ion implanter, the system including a platen, a registration device adapted to selectively move a substrate engagement surface disposed adjacent the platen for limiting movement of a substrate disposed on the platen, a camera configured to capture an image of the substrate before the substrate is disposed on the platen, and a controller in communication with the camera and the registration device, the controller configured to command the registration device to move the substrate engagement surface based on the image to limit movement of the substrate in a predetermined manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.