Gas distributor for a CVD reactor

US10221482B2 · kind B2 · utility

Assignee

• AIXTRON SE · DE

Inventors

• Thomas Krücken · Aachen, DE
• Baskar Pagadala Gopi · Aachen, DE
• Martin Dauelsberg · Aachen, DE

Key dates

• Filing date: Feb 14, 2014
• Grant date: Mar 5, 2019
• Expiry date: Dec 15, 2036

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45574
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A gas distributor for a CVD reactor includes two separate gas distribution chambers, into each of which a process gas can be fed through an infeed opening. Each of the gas distribution chambers is formed, in part, by a gas distribution device disposed in a top layer being in each case flow-connected to connecting channels disposed in a bottom layer. The connecting channels associated with different gas distribution chambers lie alternately adjacent to one another and have gas outlet openings for the process gases to escape. Each of the at least two gas distribution devices has a distribution section, which in each case is flow-connected to a plurality of sub-distribution sections. The connecting channels are flow-connected to at least one of the sub-distribution sections. The sub-distribution sections of different gas distribution chambers lie alternately adjacent to one another and are separated from one another by a dividing wall.