Method for operating an illumination system of a microlithographic projection exposure apparatus

US10222704B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Oliver Natt · Aalen, DE
• Frank Schlesener · Oberkochen, DE

Key dates

• Filing date: Jun 20, 2017
• Grant date: Mar 5, 2019
• Expiry date: Jun 20, 2037

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70191
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimization criterion. These control commands are applied to the optical elements, before the mask is illuminated.