Oliver Natt
14Patents
3h-index
24Co-inventors
56Inventor score
Filing activity: Jul 27, 2009 → Apr 23, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9316929B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 7 | Active |
| US8467033B2 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Physics | 6 | Active |
| US10031423B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 3 | Active |
| US9703206B2 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9217931B2 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US9341957B2 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US8169594B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US9568845B2 | Mirror for use in a microlithography projection exposure apparatus | Physics | 0 | Active |
| US9746778B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US10317802B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
| US10222704B2 | Method for operating an illumination system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US9116441B2 | Illumination system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US9298097B2 | Projection exposure apparatus for EUV microlithography and method for microlithographic exposure | Physics | 0 | Active |
| US10684551B2 | EUV exposure apparatus with reflective elements having reduced influence of temperature variation | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.