Patent · US Active

Method for fabricating superconducting devices using a focused ion beam

US10224475B2 · kind B2 · utility

3Cited by
12References
23Claims
0Family size

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Key dates

Filing dateJun 11, 2015
Grant dateMar 5, 2019
Priority date
Expiry dateJun 11, 2035

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N69/00

Abstract

Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.