Single-crystal manufacturing apparatus and method for controlling melt surface position
US10233565B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2016 |
| Grant date | Mar 19, 2019 |
| Priority date | — |
| Expiry date | Sep 20, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A single-crystal manufacturing apparatus including: at least two different melt surface position measuring means for measuring a melt surface position of a material melt; controlling means for controlling the melt surface position based on the measured melt surface position; and determining means for determining whether a measurement abnormality has occurred in the melt surface position measuring means, the apparatus being characterized in that the melt surface position is measured by the plurality of melt surface position measuring means at the same time, one melt surface position measuring means adopted for control over the melt surface position is selected from the plurality of melt surface position measuring means, and the melt surface position measuring means adopted for control over the melt surface position is switched to another melt surface position measuring means when the determining means determines that a measurement abnormality has occurred in the selected melt surface measuring means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.